From October 12 to 13, 2017, the first international advanced lithography technology seminar was held at the Beijing International Conference Center, sponsored by the Technology Innovation Strategic Alliance of the Integrated Circuit Industry, undertaken by the Institute of Microelectronics of the Chinese Academy of Sciences, SMIC, YMTC, Huahong Group Mentor、ASML、KLA Tencor、 Sponsored by Nata, SMEE, Synopsys, Toppan, JSR, Dongfang Jingyuan, and Shenyang Xinyuan. More than 200 attendees attended the conference, including renowned companies, manufacturers, research institutions, universities, and others from around the world such as China, the United States, Germany, and Japan. Our company's director Qin Yisheng and deputy general manager Yang Jianguo attended this seminar.

Cao Jianlin, Chairman of the Conference, Chairman of the Integrated Circuit Industry Technology Innovation Strategic Alliance, and former Deputy Minister of the Ministry of Science and Technology, Ma Junru, former Director of the State Administration of Foreign Experts Affairs, Qiu Gang, Deputy Inspector of the Major Special Projects Office of the Ministry of Science and Technology and Deputy Director of the 02 Special Implementation Management Office, delivered opening speeches for the conference. Ye Tianchun, Vice Chairman of the Conference and Director of the Institute of Microelectronics, Chinese Academy of Sciences, gave an analysis report on current industry trends. Wei Yayi, Secretary General of the Conference and Director of the Computational Lithography Research and Development Center of the Institute of Microelectronics, Chinese Academy of Sciences, presided over the opening ceremony. According to the conference schedule, special guests from companies such as Intel, IBM, Qualcomm, AMD, ASML, SMIC, etc. gave keynote speeches on the proposed topics during these two days. They analyzed in depth the technological means and solutions of advanced nodes in the field of lithography, with rich content including computational lithography technology for 7nm and below nodes SMO、DTCO、EUV、DSA、Design rules、 Lithography equipment, materials, etc. After the meeting, the attending guests took a group photo as a souvenir.